Cadence Design Systems Inc. recently announced the Quantus QRC extraction solution had been certified for TSMC 16nm FinFET.
So, what’s the uniqueness about the Cadence Quantus QRC extraction solution?
KT Moore, senior group director – Product Marketing, Digital and Signoff Group, Cadence Design Systems, said: “There are several parasitic challenges that are associated with advanced node designs — especially FinFET – and it’s not just about tighter geometries and new design rules. We can bucket these challenges into two main categories: increasing complexity and modeling challenges.
“The number of process corners is exploding, and for FinFET devices specifically, there is an explosion in the parasitic coupling capacitances and resistances. This increases the design complexity and sizes. The netlist is getting bigger and bigger, and as a result, there is an increase in extraction runtimes for SoC designs and post-layout simulation and characterization runtimes for custom/analog designs.
“Our customers consistently tell us that, for advanced nodes, and especially for FinFET designs, while their extraction runtimes and time-to-signoff is increasing, their actual time-to-market is shrinking and putting an enormous amount of pressure on designers to deliver on-time tapeout. In order to address these market pressures, we have employed the massively parallel technology that was first introduced in our Tempus Timing Signoff Solution and Voltus IC Power Integrity Solution to our next-generation extraction tool, Quantus QRC Extraction Solution.
“Quantus QRC Extraction Solution enables us to deliver up to 5X better performance than competing solutions and allows scalability of up to 100s of CPUs and machines.”
Support for FinFET features
How is Quantus providing significant enhancements to support FinFET features?
Parasitic extraction is at the forefront with the introduction of any new technology node. For FinFET designs, it’s a bit more challenging due to the introduction of non-planar FinFET devices. There are more layers to be handled, more RC effects that need to be modeled and an introduction of local interconnects. There are also secondary and third order manufacturing effects that need to modeled, and all these new features have to be modeled with precise accuracy.
Performance and turnaround times are absolutely important, but if you can’t provide accuracy for these devices — especially in correlation to the foundry golden data — designers would have to over-margin their designs and leave performance on the table.
How can Cadence claim that it has the ‘tightest correlation to foundry golden data at TSMC vs. competing solutions’? And, why 16nm only?
According to Moore, the foundry partner, TSMC, asserts that Quantus QRC Extraction Solution provides best-in-class accuracy, which was referenced in the recent press announcement:
“Cadence Quantus QRC Extraction Solution successfully passed TSMC’s rigorous parasitic extraction certification requirements to achieve best-in-class accuracy against the foundry golden data for FinFET technology.”
FinFET structures present unique challenges since they are non-planar devices as opposed to its CMOS predecessor, which is a planar device. We partnered with TSMC from the very beginning to address the modeling challenges, and we’ve seen many complex shapes and structures over the year that we’ve modeled accurately.
“We’re not surprised that TSMC has recognized our best-in-class accuracy because we’re the leader in providing extraction solutions for RF designs. Cadence Quantus QRC Extraction Solution has been certified for TSMC 16nm FinFET, however, it’s important to note that we’ve been certified for all other technology nodes and our QRC techfiles are available to our customers from TSMC today.”
At the recently held Semicon West 2014, Daniel P. Tracy, senior director, Industry Research and Statistics, SEMI, presented on SEMI Materials Outlook. He estimated that semiconductor materials will see unit growth of 6 percent or more. There may be low revenue growth in a large number of segments due to the pricing pressures and change in material.
For semiconductor eequipment, he estimated ~20 percent growth this year, following two years of spending decline. It is currently estimated at ~11 percent spending growth in 2015.
Overall, the year to date estimate is positive growth vs. same period 2013, for units and materials shipments, and for equipment billings.
For equipment outlook, it is pointing to ~18 percent growth in equipment for 2014. Total equipment orders are up ~17 percent year-to-date.
For wafer fab materials outlook, the silicon area monthly shipments are at an all-time high for the moment. Lithography process chemicals saw -7 percent sales decline in 2013. The 2014 outlook is downward pressure on ASPs for some chemicals. 193nm resists are approaching $600 million. ARC has been growing 5-7 percent, respectively.
For packaging materials, the Flip Chip growth drivers are a flip chip growth of ~25 percent from 2012 to 2017 in units. There are trends toward copper pillar and micro bumps for TSV. Future flip chip growth in wireless products are driven by form factor and performance. BB and AP processors are also moving to flip chip.
There has been growth in WLP shipments. Major applications for WLP are driven by mobile products such as smartphones and tablets. It should grow at a CAGR of ~11 percent in units (2012-2017).
Solder balls were $280 million market in 2013. Shipments of lead-free solder balls continues to increase. Underfillls were $208 million in 2013. It includes underfills for flip chip and packages. The increased use of underfills for CSPs and WLPs are likely to pass the drop test in high-end mobile devices.
Wafer-level dielectrics were $94 million market in 2013. Materials and structures are likely to enhance board-level reliability performance.
Die-attach materials has over a dozen suppliers. Hitachi Chemical and Henkel account for major share of total die attach market. New players are continuing to emerge in China and Korea. Stacked-die CSP package applications have been increasing. Industry acceptance of film (flow)-over-wire (FOW) and dicing die attach film (DDF) technologies are also happening.
Christian Gregor Dieseldorff, senior analyst, Industry Research & Statistics Group at SEMI, presented the SEMI World Fab Forecast at the recently held Semicon West 2014, as part of the SEMI/Gartner Market Symposium on July 7.
Scenarios of fab equipment spending over time has been 20-25 percent in 2014, and 10-15 percent in 2015. At this time, worldwide fab equipment spending is about same in 1H14 vs 2H14. As for fab construction projects, 2013 was a record year with over $9 billion.
New fabs: construction spending (front end cleanrooms only!)
2013: record year with over $9 billion.
2014: -22 percent to -27 percent (~$6.6 billion)
2015: -22 percent to -30 percent (~$5 billion +/-).
Fab equipment spending front end (new and used)
2014: 20 percent to 25 percent (~$35 billion to $36 billion) – if $35 billion, then third largest on record.
2015: 10 percent to 15 percent (~$40 billion) – if $40 billion, then largest in record.
Installed capacity for front end fabs (without discretes)
2014: 2 to 3 percent
2015: 3 to 4 percent
Future outlook beyond 2015: less than 4 percent.
SEMI World Fab Forecast report status and activity outlined that there were 1,148 front end facilities (R&D to HVM) active and future. Also,
* There are 507 companies (R&D to HVM).
* Including 249 LEDs and Opto facilities active and future.
* There are 60 future facilities starting HVM in 2014 or later.
* Major investments (construction projects and/or equipping): 202 facilities in 2014, 189 facilities in 2015.
A slow down of fab closures is expected from 2015 to 2018 for 200mm fabs and 150mm fabs.
What does the future hold for MEMS? How can the MEMS indistry stay profitable and innovative in the next five years? The MEMS market is still in a dynamic growth with an estimated 12.3 percent CAGR over 2013-2019 in $US value, growing from $11.7 billion in 2013 to $24 billion in 2019.
This growth, principally driven by a huge expansion of consumer products, is mitigated by two main factors. First, due to a fierce competition based on pricing, the ASPs are continuously decreasing.
Second, innovation is slow and incremental, as no new devices have been successfully introduced on the market since 2003. Fierce competition based on pricing in now ongoing putting thus extreme pressure on device manufacturers.
Some trends are still impacting MEMS business. These are:
* Decrease of price in consumer electronics; ASP of MEMS microphones.
* Component size is still decreasing.
However, successful companies are still large leaders in distinct MEMS categories, such as STMicroelectronics, Knowles, etc. But maintaining growth in consumer electronic applications remains a challenge.
The market for motion sensor in cell phones and tablets is large and continuously expanding. Discrete sensors still decline, but will still be used in some platforms (OIS function for gyros). Next, 6- and 9-axis combos should grow rapidly. Because of strong price pressure and high adoption rate, the total market will stabilize from 2015.
STMicroelectronics, InvenSense and Bosch are still leaders in 3-axis gyros and 6-axis IMUs. It seems difficult for new players to compete and be profitable in this market. The automotive, industrial and medical applications of MEMS are driving growth of MEMS business. MEMS for automotive will grow from $2.6 billion in 2012 to $3.6 billion in 2018 with 5 percent CAGR.
MEMS industry is big and growing. Strong market pull observed for sensors and actuators in cell phones, automotive, medical, industrial.
• Not limited to few devices. A new wave of MEMS is coming!
• Component and die size are still being optimized while combo approaches become mainstream. And several disruptive technology approaches are now in development to keep going in term of size and price decrease.
• But the MEMS industry has not solved a critical issue: how to increase the chance of new devices to enter the market?
–RF switch, autofocus, energy harvesting devices, fuel cells… are example of devices still under development after over 10 years of effort.
–How to help companies to go faster and safer on the market with new devices?
Engineers designing FPGA applications face many challenges. Using Plunify’s automation and analysis platform, engineers can run 100 times more builds, analyze a larger set of builds and quickly zoom in on better quality results. Using data analytics and the cloud, Plunify created new capabilities for FPGA design, with InTime being an example.
Kirvy Teo said: What happens when you need to close timing in FPGA design and still can’t get it to work? Here is a new way to solve that problem – machine learning and analytics. InTime is an expert software that helps FPGA design engineers meet timing and area goals by recommending “strategies”. Strategies are combination of settings found in the existing FPGA software. With more than 70 settings available in the FPGA software, no sane FPGA design engineer have the time or capacity to understand how these affect the design outcomes.
One of the common methods now is to try random bruteforce using seeds. This is a one-way street. If you get to your desired result, great! If not, you would have wasted a bunch of time running builds with you none the wiser. Another aspect of running seeds is that the variance of the results is usually not very big, meaning you can’t run seeds on a design with bad timing scores.
However, using InTime, all builds become part of the data that we used to recommend strategies that can give you better results, using machine learning and predictive analytics. This means you will definitely get a better answer at the end of the day, and we have seen 40 percent performance improvements on designs!
How has Plunify been doing this year so far? According to Teo, Plunify did a controlled release to selected customers in first quarter of 2014, who are mainly based in China. It is easier to guess who as we nicknamed them “BCC” – Big Chinese Corporations.
Unsurprisingly, they have different methodologies to solving timing problems and design guidelines, many of which were done to pre-empt timing problems at the later stage of the design. InTime was a great way to help them to achieve their performance targets without disrupting their tool flows.
Plunify is announcing the launch of InTime during DAC and will be looking to partner with sale organizations in US.
What’s the future path likely to be? Teo added: “Machine learning and predictive analytics are one of the hottest topics and we have yet seen it being used much in chip design. We see a lot of potential in this sector. Beyond what InTime is doing now, there are still many chip design problems that can be solved with similar techniques.
“First, there is a need to determine the type of problems that can be solved with these techniques. Second, we are re-looking at existing design problems and wondering, if I can throw 100 or 1000 machines to this problem, can I get a better result? Third, how to get that better result without even running it!
“As you know, we do offer a FPGA cloud platform on Amazon. One of the most surprising observations is that people do not know how to use all those cheap power in the cloud! FPGA design is still confined to a single machine for daily work, like email. Even if I give you 100 machines, you don’t know how to check your emails faster! We see the same thing, the only method they know is to run seeds. InTime is what they need to make use of all these resources intelligently.
Why would FPGA providers take up the solution?
The InTime software works as a desktop software which can be installed in internal data centers or desktops. It is on longer just a cloud play. It works with the current in-house FPGA software that the customer already own. We are helping FPGA providers like Xilinx or Altera, by helping their customers with the designs. They will feel: How about “Getting better results without touching your RTL code!”
In 2013, the global semiconductor industry had touched $306 billion or so. Sales had doubled from $100 billion to $200 billion in six years — from 1994 to 2000. It was enterprise sales that was driving this. It has taken 14 years to move past $300 billion, said Anil Gupta, managing director, Applied Micro Circuits India Pvt Ltd, at the UVM 1.2 day.
This time, consumption of semiconductors is not only around enterprise, but social networks as well. Out of the $306 billion, logic was approximately $86 billion, memory was $67 billion, and micro was $58 billion. We, as consumers, are starting to play a huge role.
However, the number of large players seem to be shrinking. Mid-size firms, like Applied Micro, are said to be struggling. Technology is playing an interesting role. There is a very significant investment in FinFETs. It may only get difficult for all of us. Irrespective, all of this is a huge barrier to the mid- to small-companies. Acquisitions are probably the only route, unless you are in software.
In India, we have been worried for a while, whether the situation will be a passing phase. We definitely will have a role to play. From an expertise perspective, thanks to our background, we have been a poor nation. For us, the job is the primary goal. We need to think: how do we deliver value? We have to try and keep creating value for as long as possible.
As more and more devices actually happen, many other things are also happening. An example for devices is power. We still have a fair number of years ahead where there will be opportunities to deliver value.
What’s happening between hardware and software? The latter is in demand. Clearly, there is a trend to make the hardware a commodity. However, hardware s not going away! Therefore, the opportunity for us to deliver value is huge.
Taking the tools to make something, is critical. UVM tools are critical. But, somewhere along the way, we seem to stop at that. We definitely need to add value. UVM’s aim is to make things re-usable.
Don’t loose your focus while doing verification. Think about the block, the subsystem and the top. You need to and will discover and realize how valuable it is to find a bug, before the tape out of the chip.
Are we at an inflection point in verification today? Delivering the guest keynote at the UVM 1.2 day, Vikas Gautam, senior director, Verification Group, Synopsys, said that today, mobile and the Internet of Things are driving growth. Naturally, the SoCs are becoming even more complex. It is also opening up new verification challenges, such as power efficiency, more software, and reducing time-to-market. There is a need to shift-left to be able to meet time-to-market goal.
The goal is to complete your verification as early as possible. There have been breakthrough verification innovations. System Verilog brought in a single language. Every 10-15 years, there has been a need to upgrade verification.
Today, many verification technologies are needed. There is a growing demand for smarter verification. There is need for much upfront verification planning. There is an automated setup and re-use with VIP. There is a need to deploy new technologies and different debug environments. The current flows are limitimg smart verification. There are disjointed environments with many tools and vendors.
Synopsys has introduced the Verification Compiler. You get access to each required technology, as well as next-gen technology. These technologies are natively integrated. All of this enables 3X verification productivity.
Regarding next gen static and formal platforms, there will be capacity and performance for SoCs. It should be compatible with implementation products and flows. There is a comprehensive set of applications. The NLP+X-Prop can help find tough wake-up bug at RTL. Simulation is tuned for the VIP. There is a ~50 percent runtime improvement.
System Verilog has brought in many new changes. Now, we have the Verification Compiler. Verdi is an open platform. It offers VIA – a platform for customizing Verdi. VIA improves the debug efficiency.
Following a host of forecasts for 2014, it is now the turn of Applied Materials with its forecast for the year. First, I asked Om Nalamasu, senior VP, CTO, Applied Materials regarding the outlook for the global semicon industry in 2014.
Semicon outlook 2014
He said that Gartner expects the semiconductor industry to grow in mid-single digits to over $330 billion in 2014.
“In our industry – the semiconductor wafer fab equipment sector – we are at the beginning of major technology transitions, driven by FinFET and 3D NAND, and based a wide range of analyst projections, wafer fab equipment investment is expected to be up 10-20 percent in 2014. We expect to see a year-over-year increase in foundry, NAND, and DRAM investment, with logic and other spending flat to down.”
Five trends for 2014
Next, what are the top five trends likely to rule the industry in 2014?
Nalamasu said that the key trends continuing to drive technology in 2014 and beyond include 3D transistors, 3D NAND, and 3D packaging. 3D remains a central theme. In logic, foundries will ramp to 20nm production and begin early transition stages to3D finFET transistors.
With respect to 3D NAND, some products will be commercially available, but most memory manufacturers plan to crossover from planar NAND to vertical NAND starting this year. In wafer level packaging, critical mechanical and electrical characterization work is bringing the manufacturability of 3D-integrated stacked chips closer to reality.
These device architecture inflections require significant advances in precision materials engineering. This spans such critical steps as precision film deposition, precision materials removal, materials modification and interface engineering. Smaller features and atomic-level thin films also make interface engineering and process integration more critical than ever.
Driving technology innovations are mobility applications which need high performance, low power semiconductors. Smartphones, smart watches, tablets and wearable gadgets continue to propel industry growth. Our customers are engaged in a fierce battle for mobility leadership as they race to be the first to market with new products that improve the performance, battery-life, form-factor and user experience of mobile devices.
How is the global semiconductor industry managing the move to the sub 20nm era?
He said that extensive R&D work is underway to move the industry into the sub-20nm realm. For the 1x nodes, more complex architectures and structures as well as new higher performance materials will be required.
Some specific areas where changes and technology innovations are needed include new hard mask and channel materials, selective material deposition and removal, patterning, inspection, and advanced interface engineering. For the memory space, different memory architectures like MRAM are being explored.
FinFETs in 20nm!
By the way, have FinFETs gone to 20nm? Are those looking for power reduction now benefiting?
FinFET transistors are in production in the most advanced 2x designs by a leading IDM, while the foundries are in limited R&D production. In addition to the disruptive 3D architecture, finFET transistors in corporate new materials such as high-k metal gate (HKMG) that help to drastically reduce power leakage.
Based on public statements, HKMG FinFET designs are expected to deliver more than a 20 percent improvement in speed and a 30 percent reduction in power consumption compared to28nm devices. These are significant advantages for mobile applications.
Status of 3D ICs
Finally, what’s the status with 3D ICs? How is Applied helping with true 3D stacking integration?
Nalamasu replied that vertically stacked 3D ICs are expected to enter into production first for niche applications. This is due primarily to the higher cost associated with building 3D wafer-level-packaged (WLP) devices. While such applications are limited today, Applied Materials expects greater utilization and demand to grow in the future.
Applied is an industry leader in WLP, having spear-headed the industry’s development of through silicon via (TSV) technology. Applied offers a suite of systems that enable customers to implement a variety of packaging techniques, from bumping to redistribution layer (RDL) to TSV. Because of work in this area, Applied is strongly positioned to support customers as they begin to adopt this technology.
To manufacture a robust integrated 3D stack, several fundamental innovations are needed. These include improving defect density and developing new materials such as low warpage laminates and less hygroscopic dielectrics.
Another essential requirement is supporting finer copper line/spacing. Important considerations here are maintaining good adhesion while watching out for corrosion. Finally, for creating the necessary smaller vias, the industry needs high quality laser etching to replace mechanical drilling techniques.
Here is the concluding part of my conversation with Synopsys’ Rich Goldman on the global semiconductor industry.
Global semicon in sub 20nm era
How is the global semicon industry performing after entering the sub 20nm era? Rich Goldman, VP, corporate marketing and strategic alliances, Synopsys, said that driving the fastest pace of change in the history of mankind is not for the faint of heart. Keeping up with Moore’s Law has always required significant investment and ingenuity.
“The sub-20nm era brings additional challenges in device structures (namely FinFETs), materials and methodologies. As costs rise, a dwindling number of semiconductor companies can afford to build fabs at the leading edge. Those thriving include foundries, which spread capital expenses over the revenue from many customers, and fabless companies, which leverage foundries’ capital investment rather than risking their own. Thriving, leading-edge IDMs are now the exception.
“Semiconductor companies focused on mobile and the Internet of Things are also thriving as their market quickly expands. Semiconductor companies who dominate their space in such segments as automotive, mil/aero and medical are also doing quite well, while non-leaders find rough waters.”
Performance of FinFETs
Have FinFETs gone to below 20nm? Also, are those looking for power reduction now benefiting?
He added that 20nm was a pivotal point in advanced process development. The 20nm process node’s new set of challenges, including double patterning and very leaky transistors due to short channel effects, negated the benefits of transistor scaling.
To further complicate matters, the migration from 28nm to 20nm lacked the performance and area gains seen with prior generations, making it economically questionable. While planar FET may be nearing the end of its scalable lifespan at 20nm, FinFETs provide a viable alternative for advanced processes at emerging nodes.
The industry’s experience with 20nm paved the way for an easier FinFET transition. FinFET processes are in production today, and many IC design companies are rapidly moving to manufacture their devices on the emerging 16nm and 14nm FinFET-based process geometries due to the compelling power and performance benefits. Numerous test chips have taped out, and results are coming in.
“FinFET is delivering on its promise of power reduction. With 20nm planar FET technologies, leakage current can flow across the channel between the source and the drain, making it very difficult to completely turn the transistor off. FinFETs provide better channel control, allowing very little current to leak when the device is in the “off” state. This enables the use of lower threshold voltages, resulting in better power and performance. FinFET devices also operate at a lower nominal voltage supply, significantly improving dynamic power.”