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Integrating next-gen technology into nano/MEMS facilities

September 23, 2012

CH2M HLL on nanomanufacturing.

CH2M HLL on nanomanufacturing.

CH2M HLL is a global leader in consulting, design, design-build, operations, and program management. Its ultimate goal is to link nanotechnologies to high-tech manufacturing.

Nanomanufacturing techniques for scale include photo-lithography techniques, e-beam lithography techniques, ion-beam lithography techniques, nano-imprint lithography, nanofabrication by self-assembly and laser technology processes.

There are three major challenges for cost-effective nanomanufacturing — flexibility, critical environment scale-up and safety, sustainability and health (SSH). Also, nanomanufacturing requires high flexibility. Nanofacility critical environments include electromagnetic interference, cleanliness, vibration, temperature and humidity control, adaptive HVAC zones, airborne molecular contamination (AMC) and acoustics.

There are nano facility site planning challenges such as surface transit, direct current light rail, high voltage lines and truck and bus traffic. There is a need to analyse the detailed ambient conditions study and subsurface vibration testing, which is 3-4 meters below grade. Solutions include ‘no-build zones for vibration, EMI and RFI, building outside zones, identify ‘sweet spot’, VC-E lower/first level, and remediation by mass such as slab size lower level and slab size first level.

The proposed model for CH2M HLL’s China nanomanufacturing includes top level R&D labs, stacked cleanrooms for pilot and manufacturing, nano/MEMS/NEMS, ISO 5 and 7 cleanrooms, VC-D and VC-C vibration criteria, E-beam metrology, TEM suite capability and remote bulk gas pad. The proposed China baseline is in Suzhou, China.

Headquartered in Englewood, Colorado, USA, CH2M HLL has nearly 30,000 employees. Broadly diversified across multiple business sectors, it had $6.4 billion in revenue (2011).

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