Metro450 Conference 2014 discusses all things 450mm wafers!
Thanks to the Enable450 newsletter, sent out by Malcolm Penn, CEO, Future Horizons, here is a piece on the Metro450 Conference 2014, held earlier this year in Israel.
Metro450 is an Israel-based consortium with the goal of helping the metrology companies advance in their fields. The consortium’s members include metrology and related companies, as well as academics who support these companies by performing basic research.
The conference was sponsored by the Israeli Chief Scientist Office, by Applied Materials Israel and by Intel. There were several goals for the conference: to provide an opportunity for industry leaders as well as academicians to meet and discuss the latest developments in the world of metrology, to present these advances to audiences which would normally not be privy to such information, and to learn more about the international effort in 450mm wafer technology.
Over 200 people attended this conference from Israeli companies and academia, as well as from Europe and the United States. Israeli companies included Applied Materials, Jordan Valley, Nova, KLA, Zeiss Israel, and others. Academic members included researchers from the leading Israeli universities, including the Technion, Tel-Aviv U. and Haifa U. European companies were represented by ENIAC, as well as large corporations such as ASML as well SME-based companies. The G450C consortium, based in Albany, N.Y. was also well represented at this conference.
Some of the highlights of the conference included scientific discussions of different metrology methods, and their adjunct requirements, such as improved rapid wafer movement, improved sampling methods and fast computing. Presentations also included an overview of the advances necessary to move the industry forward, optical CD metrology, x-ray metrology, and novel piezo-based wafer movement.
A panel discussed various broad industry trends, including the timeline of 450mm wafers, European programs and the Israeli programs. International speakers discussed the European technology model, risk mitigation of 450 through collaborations, 450 collaborative projects under ENIAC, 450mm wafer movement challenges and metrology challenges beyond 14nm.
This second annual Metro450 conference took place this January at the Technion, Israel.